عنوان مقاله [English]
The thin films of N: ZnO are deposited on the glass substrate by the DC magnetron sputtering in 10-2 Torr pressure in equal amount of Ar and N2 as sputtering gas. Thickness, morphology, crystalline structure and optical properties of layers were detected in three different sputtering time depositions. By increasing the time deposition, the thickness of the layers, the roughness of the surfaces and the height of the grains increase. The hexagonal (wurtzite) N:ZnO structure layers have grown with high (002) textured structure. In the N:ZnO, the lattice parameter, c, increases compare to pure ZnO. These layers have an optical gap about 3.2 eV which increased with thickness increasing this result was confirmed by photoluminescence spectra. The Raman spectrum confirmed the XRD results and the doping of nitrogen into the crystal structure of zinc oxide. The thickness of the layers was calculated by the Swanepoel method, which was close to the thickness measurement.
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