بررسی اثر زمان لایه نشانی بر خواص فیزیکی لایه های نازک N:ZnO

نوع مقاله: مقاله پژوهشی کامل


1 آزمایشگاه نانو1-دانشکده پلاسما- دانشگاه آزاد واحد علوم و تحقیقات- تهران- ایران

2 آزمایشگاه نانو1، پژوهشکده پلاسما، دانشگاه آزاد اسلامی واحد علوم و تحقیقات، تهران، ایران


در این تحقیق لایه‌های نازک N:ZnO روی زیر لایه شیشه با استفاده از کندوپاش DC در فشار کاری Torr 2-10×2 در مخلوط گازهای آرگون و نیتروژن لایه نشانی شدند. ضخامت، ریخت‌شناسی، ساختار کریستالی و خواص اپتیکی لایه‌ها در سه زمان کندوپاش مختلف شناسایی شدند. با افزایش زمان لایه نشانی، ضخامت لایه‌ها، زبری سطح و ارتفاع دانه‌ها افزایش می‌یابد. لایه‌ها دارای بافت قوی کریستالی در راستای (002) با ساختار هگزاگونال (ورتسایست) هستند. با ورود نیتروژن به درون ساختار بلوری ZnO ثابت شبکه c نسبت به حالت ZnO خالص افزایش می‌یابد. شکاف باند اپتیکی لایه‌ها نزدیک 2/ 3 الکترون ولت بدست آمد که با افزایش ضخامت افزایش یافت این نتیجه با طیف سنجی فوتولومینسانس تایید شد. طیف رامان مؤید نتایج XRD و ورود آلایش نیتروژن به درون ساختار کریستالی اکسید روی بود. ضخامت لایه‌ها با روش سوین پل محاسبه شد که نزدیک به ضخامت اندازه‌گیری شده بود.


عنوان مقاله [English]

Investigation of the layer deposition time effects on physical properties of thin layers N:ZnO

نویسندگان [English]

  • Sara Sadat Parhizgar 1
  • Fatemeh morovati 2
1 Nanolab1, Plasma Physics Center,Science and Research Branch, Islamic Azad University
2 Nanolab1, Plasma Physics Center,Science and Research Branch, Islamic Azad University,Tehran, Iran
چکیده [English]

The thin films of N: ZnO are deposited on the glass substrate by the DC magnetron sputtering in 10-2 Torr pressure in equal amount of Ar and N2 as sputtering gas. Thickness, morphology, crystalline structure and optical properties of layers were detected in three different sputtering time depositions. By increasing the time deposition, the thickness of the layers, the roughness of the surfaces and the height of the grains increase. The hexagonal (wurtzite) N:ZnO structure layers have grown with high (002) textured structure. In the N:ZnO, the lattice parameter, c, increases compare to pure ZnO. These layers have an optical gap about 3.2 eV which increased with thickness increasing this result was confirmed by photoluminescence spectra. The Raman spectrum confirmed the XRD results and the doping of nitrogen into the crystal structure of zinc oxide. The thickness of the layers was calculated by the Swanepoel method, which was close to the thickness measurement.

کلیدواژه‌ها [English]

  • DC Magnetron Sputtering
  • Swanepoel Method
  • photoluminescence spectra
  • Raman spectra
  • N: ZnO

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