بررسی تاثیر دمای بازپخت بر ویژگی های ساختاری، ریخت شناسی و نوری لایه های نازک Cu/NiO

نوع مقاله : مقاله پژوهشی کامل

نویسندگان

گروه فیزیک، واحد کرج، دانشگاه آزاد اسلامی، کرج، ایران

چکیده

در‌این تحقیق، ابتدا لایه‌های نازک Cu/NiO بر روی‌ زیر‌‌‌لایه‌های شیشه ‌‌و‌سیلسیوم ‌‌با‌‌روش کندوپاش واکنشی مگنترونی RFانباشت شده ‌و‌ سپس نمونه‌ها‌ در ‌دماهای 473، 673‌ و K‌873‌‌ بازپخت حرارتی شده‌اند. برای بررسی ویژگی‌های ساختاری، ریخت شناسی و نوری نمونه‌ها ‌از ‌آنالیزهای مختلفی استفاده شده‌است. نتایج پراش پرتو ایکس نمونه ها بیانگر آن است که ساختار تمامی لایه‌های تهیه شده بی شکل می باشند. آنالیز FTIR قله‌ای را در عدد موج، cm-1 52/596 نشان می دهد که مربوط به پیوند Ni-O می باشد. آنالیز map EDS نیز ‌وجود‌ عناصر نیکل،‌اکسیژن ‌و مس را‌ در لایه‌های تهیه شده تایید می کند. نتایج ‌آنالیز AFM‌‌ و ‌FESEM نشان می‌دهند‌ که ریخت شناسی سطح لایه‌ها‌ به شدت تحت تاثیر دمای بازپخت قرار گرفته و ‌‌‌زبری میانگین لایه‌ها بین 19/0 تا 50/0‌ نانو متر و جذر میانگین مربعی ‌زبری بین 25/0‌ تا ‌63/0 نانو‌متر تغییر کرده ‌است. همچنین، تغییر دمای بازپخت گاف نواری نوری نمونه‌ها را تحت تأثیر خود قرار‌داده و گاف نواری نوری نمو نه‌ها‌ در محدوده 14/3 تا50/3‌ الکترون ولت تغییر نموده ‌است.

کلیدواژه‌ها

موضوعات


عنوان مقاله [English]

Effect of annealing temperature on structural, morphological and optical properties of Cu/NiO thin films

نویسندگان [English]

  • Elnaz Feyzi
  • Fatemeh Hajakbari
  • Alireza Hojabri
Department of Physics, Karaj Branch, Islamic Azad University, Karaj, Iran
چکیده [English]

In this study, Cu/NiO thin films were first deposited on glass and silicon substrates by the RF reactive magnetron sputtering and then the samples thermally annealed at 473, 673 and 873 K. For investigation of structural, morphological and optical properties of the films different analysis were employed. X-ray diffraction results indicate that all samples are amorphous. FTIR analysis shows a peak in the wavelength range 596.52 cm-1, which is related to Ni-O bonding. EDS map analysis also confirms the presence of nickel, oxygen and copper in the prepared layers. The results of AFM and FESEM analysis show that the morphology of the films is strongly influenced by the annealing temperature. The average roughness of films was varied between 0.19-0.50 nm and root mean square roughness was changed between 0.25-0.63 nm. Also, by variation of annealing temperature the optical band gap of the samples effectively influenced and optical band gap of the samples has changed between 3.14-3.50 eV.

کلیدواژه‌ها [English]

  • Nickel oxide
  • Cu/NiO
  • RF reactive magnetron sputtering
  • Thermal annealing
  • optical properties
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