In this study, PEDOT:PSS, Alq3 and Al thin films were deposited on the ITO substrate, respectively. The of aluminum thin films with different thicknesses and deposition rates were deposited on Alq3 film by thermal evaporation technique. The structure of the films by X-ray diffraction (XRD) and their morphology by field effect scanning electron microscope (FESEM) and atomic force microscopy (AFM) were studied. X-ray diffraction characterization showed that the films prepared with a thickness less than 100 nm and with a deposition rate less than 1 nm/s have a polycrystalline structure with a peak along the (111) plane. The FESEM images show the grain structure of the samples. Increasing deposition rate leads to the increase of clusters on the surface of film that resulting an increase in the size of the grains. The AFM images show that increasing the thickness and deposition rate of film cause to increase the surface roughness of film.
[1] E. Feyzi, F. Hajakbari, A.R. Hojabri, Effect of annealing temperature on structural, morphological and optical properties of Cu/NiO thin films, Journal of Research on Many-body Systems12 (2022) 23-36. https://jrmbs.scu.ac.ir/article_17344.html
[3]K. Bordo, H.-G. Rubahn, Effect of deposition rate on structure and surface morphology of thin evaporated Al films on dielectrics and semiconductors, Materials Science18 (2012) 313-317.https://doi.org/10.5755/j01.ms.18.4.3088
[4] H. Khachatryan, S.-N. Lee, K.-B. Kim, H.-K. Kim, M. Kim, Al thin film: The effect of substrate type on Al film formation and morphology, Journal of Physics and Chemistry of Solids122 (2018) 109-117.https://doi.org/10.1016/j.jpcs.2018.06.018
[5]G. Hass, J.E. Waylonis, Optical constants and reflectance and transmittance of evaporated aluminum in the visible and ultraviolet, JOSA51 (1961) 719-722.https://doi.org/10.1364/JOSA.51.000719
[6] C.W. Hollars, R.C. Dunn, Evaluation of thermal evaporation conditions used in coating aluminum on near-field fiber-optic probes, Review of Scientific Instruments69 (1998) 1747-1752.
[7]M. Yahya, M.R. Fadavieslam, The effects of argon plasma treatment on ITO properties and the performance of OLED devices, Optical Materials120 (2021) 111400.https://doi.org/10.1016/j.optmat.2021.111400
[8]H. Khachatryan, S.-N. Lee, K.-B. Kim, M. Kim, Deposition of Al thin film on steel substrate: the role of thickness on crystallization and grain growth, Metals9(2018) 12. https://doi.org/10.3390/met9010012
[9]S.K. Sharma, D.Y. Kim, Abnormal residual stress in nanostructured Al thin films grown on Ti/glass substrates, Current Applied Physics13 (2013) 1874-1879. https://doi.org/10.1016/j.cap.2013.07.022
Fadavieslam, M. R., & Shariatiniya, F. (2023). The study effect of thickness and deposition rate on structural properties of aluminum thin films prepared by thermal evaporation technique. Journal of Research on Many-body Systems, 13(2), 31-38. doi: 10.22055/jrmbs.2023.18298
MLA
Mohammad Reza Fadavieslam; Fatemeh Shariatiniya. "The study effect of thickness and deposition rate on structural properties of aluminum thin films prepared by thermal evaporation technique". Journal of Research on Many-body Systems, 13, 2, 2023, 31-38. doi: 10.22055/jrmbs.2023.18298
HARVARD
Fadavieslam, M. R., Shariatiniya, F. (2023). 'The study effect of thickness and deposition rate on structural properties of aluminum thin films prepared by thermal evaporation technique', Journal of Research on Many-body Systems, 13(2), pp. 31-38. doi: 10.22055/jrmbs.2023.18298
VANCOUVER
Fadavieslam, M. R., Shariatiniya, F. The study effect of thickness and deposition rate on structural properties of aluminum thin films prepared by thermal evaporation technique. Journal of Research on Many-body Systems, 2023; 13(2): 31-38. doi: 10.22055/jrmbs.2023.18298
)