In this paper, in the framework of ballistic deposition model we simulate a thin film growth in the presence of two kinds of particles: an impurity particle (C) and an active particle (A).We calculate the roughness exponent and growth exponent of our model and compare them with the results of Kardar-Parisi-Zhang (KPZ) universality class. We find a critical probability (pc) in a way that for values smaller than pc, our model belongs to KPZ universality class, while for values greater than pc it does not belong to KPZ universality class.
Emamipour, H. & Niknejhad, M. (2013). Simulation of a thin film growth in the presence of active and impurity particles. Journal of Research on Many-body Systems, 3(5), 1–8.
MLA
Emamipour, H., & Niknejhad, M. "Simulation of a thin film growth in the presence of active and impurity particles", Journal of Research on Many-body Systems, 3, 5, 2013, 1–8.
HARVARD
Emamipour, H., & Niknejhad, M. (2013). 'Simulation of a thin film growth in the presence of active and impurity particles', Journal of Research on Many-body Systems, 3(5), pp. 1–8.
CHICAGO
Emamipour, H. & Niknejhad, M., "Simulation of a thin film growth in the presence of active and impurity particles." Journal of Research on Many-body Systems, 3 5 (2013): 1–8,
VANCOUVER
Emamipour H., Niknejhad M. Simulation of a thin film growth in the presence of active and impurity particles. J. Res. Many-Body Syst. 2013;3(5):1–8 (In Persian).
